In the electronic industry hydrofluoric acid is the key chemical in the manufacture of silicon-based semi-conductor devices. Its ability to attack silicon oxide and to transform it into soluble compounds is the basis of multiple
applications in cleaning and etching processes.

Hydrofluoric acid is used in conjunction with nitric acid for silicon etching, as buffered oxide etch in combination with ammonium fluoride solutions, and as dilute HF for final cleaning steps and the removal of native oxides.

Semi-conductor devices are crucial for the functioning of many consumer articles designed to make life easier, such as washing machines, PCs, refrigerators, mobile phones, camcorders and many others, but they are also key elements in the electronic systems in cars, aeroplanes and trains.